Project C9;     (2010 - 2014)

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Optical Properties of Silicon-Based Test Masses

    Principal Investigators: Ronny Nawrodt, Roman Schnabel

The new project C9 experimentally researches the optical properties and prospects of silicon-based test masses. Two novel setups will be developed allowing the determination of the optical absorption of silicon test masses at the laser wavelength of 1550 nm in a wide temperature range from 5 to 300K. At the Leibniz Universität Hannover interferometric measurements based on the temperature dependence of the refractive index will provide precise absorption data near room temperature. At the Friedrich-Schiller-Universität Jena a micro-calorimetric experiment will provide precise absorption data at cryogenic temperatures. Another concern of this project is the optical quality of silicon test mass surfaces. Reflectivities and optical absorption of dielectric Si-SiO2-coatings will be investigated in view of an adoption in future gravitational wave detectors.

 

Researchers

  Ronny Nawrodt   Postdoc, PI 2010
  Roman Schnabel   Professor, PI 2010
  Christian Katzer   Student, 2010
  Julius Komma   PhD Student, 2010
  Christoph Krueger   PhD Student, 2014
  Andreas Sawadsky   PhD Student, 2013, 2014
  Jessica Steinlechner   PhD Student, 2010, 2011

Former Associates
  Felix Küster   Student, 2013
  Martin Lewin   Student, 2011-2012
  Philip Pastrik   Student, 2011-2013
  Martin Salge   Student, 2011
  Malte Siems   Student, 2013-2014

Publications

[1] Measurement of the optical absorption of bulk silicon at cryogenic temperature and the implication for the Einstein Telescope
J. Degallaix, J. Komma, D. Forest, G. Hofmann, M. Granata, D. Heinert, C. Schwarz, R. Nawrodt, L. Pinard, C. Michel, R. Flaminio, G. Cagnoli, Class. Quantum Grav. 31 (2014) 185010

[2] Optical absorption measurement at 1550 nm on a highly-reflective Si/SiO2 coating stack
J. Steinlechner, A. Khalaidovski, R. Schnabel, Class. Quantum Grav. 31 (2014) 105005

[3] Optical absorption measurements on crystalline silicon test masses at 1550 nm
J. Steinlechner, C. Krüger, N. Lastzka, S. Steinlechner, A. Khalaidovski, R. Schnabel, Class. Quantum Grav. 30 (2013) 095007

[4] , Applied Optics 51, 1156-1161

[5] Indication for dominating surface absorption in crystalline silicon test masses at 1550 nm
A. Khalaidovski, J. Steinlechner, R. Schnabel, Class. Quantum Grav. 30 (2013) 165001

[6] Absorption Measurements of Periodically Poled Potassium Titanyl Phosphate (PPKTP) at 775 nm and 1550 nm
J. Steinlechner, S. Ast, C. Krueger, A. Pal Singh, T. Eberle, V. Haendchen, R. Schnabel, Sensors, 13 (1), 565-573

[7] Thermo-optic coefficient of silicon at 1550 nm and cryogenic temperatures
J. Komma, C. Schwarz, G. Hofmann, D. Heinert, R. Nawrodt, Appl. Phys. Lett. 101 (2012) 041905

Theses

[8] Absorption elektromagnetischer Strahlung in Halbleitern
A. Töpfer, Staatsexamen Thesis

[9] Präzisionsmessungen an Laborspiegeln hoher Reflektivität
F. Küster, BSc Thesis

[10] Optische Eigenschaften von Silizium bei tiefen Temperaturen
P. Pastrik, BSc Thesis

[11] Bestimmung der Absorption in Silizium bei 1550 nm
M. Siems, BSc Thesis

[12] Messung des thermo-optischen Koeffizienten von Saphir von 10 bis 410 Kelvin
B. Seyfarth, BSc Thesis